Thermal/UV Nanoimprint System NI-1000

1. Size : 1200x1200x1800(mm)　Weight: 700kg

2. Basic functions

This system （NI-1000）enables simultaneous UV and thermal NIL, allowing a submicron order alignment in a vacuum chamber. It is designed for imprinting UV-curable thermoplastic polymers as well as low viscosity epoxy resins using a low press head.
Size of wafer and stamper: φ50mm
Temperature: 60~200℃
Imprint pressure :2~2000N
Head feeding resolution: 0.1µm
User interface: Windows based interface

3. Options

Alignment: Manual - Precision: ±5µm (Air)
Alignment: Fully automated - Using image processing and piezoelectric actuator - Precision: ±0.5µm (Vacuum)
UV exposure: Uniform exposure by scanning
Vacuum: Vacuum chamber and rotary pump - 5Pa
Turbo molecular pump: 1x30-3Pa
High response/high temperature ceramic heater: 650℃
Soft pressure head: 20g
High pressure head: 10kN

4. Utilities

Power: 200V 50A
Compressed air: 0.5MPa

Desktop Thermal Nanoimprint System NI-1075

1. Size: 1260x750x560(mm) (without protuberant parts) Weight: ca. 190kg

2. Basic functions

This system （NI-1075）is a small-sized thermal nanoimprint process equipment for research and development. It enables not only a high-accuracy control on temperatures of molds and substrates, load onto molds, and load-displacement of molds, which are the parameters for a nanoimprint process, but also a nanoimprint process, with the molded parts hermetically sealed by a vacuum chamber. It is applicable to nanoimprint-process experiments on resin and glass materials, as both molds and substrates are heatable up to 650 degrees C.
Max. temperature: 650℃
Max. heating time: 10sec. (RT→250℃) or 30sec. (RT→650℃)
Cooling: Natural cooling
Efficient imprint area: 50mmx50mm
Temperature distribution in the heater surface: Max. 1% (200℃)
Max. imprint force: 10kN
Head travel resolution ability: 0.1µm
Parallelization of the pressurization surface: Manual
Process control: Automatic (lad control and displacement control) and manual

3. System structure

Main unit: Performs the nanoimprint process.
Input unit: Orders the input of process conditions, the implementation and the stop of a process. Monitors the operating state of the main unit. Combined with the main unit by the stretchy fixed base.
Vacuum-pump unit (Not shown in the image): A vacuum exhauster for a vacuum process. Combined with the vacuum chamber of the main unit by a vacuum tube.

Desktop Thermal Nanoimprint System NI-273

1. Size: 1260x750x560(mm) (without protuberant parts) Weight: ca. 190kg

2. Basic functions

Conform to those of NI-1075 except for the followings.
Efficient imprint area: 25mmx25mm
Max. imprint force: 2kN

3. System structure

Conforms to that of NI-1075.

Roller Nanoimprint System

1. Size: 750(W)x560(D)x890(H)(mm) Weight: 200kg

2. Basic specification

This system performs precisely controlled thermal nanoimprint processes.
Max. temperature: 200℃
Max. heating time: 60sec. (RT→200℃)
Cooling: Natural cooling
Efficient imprint area: 85mmx85mm and more
Temperature distribution in the heater surface: Max. 5% (200℃)
Max. imprint force: 2kN
Head travel resolution ability: 0.1µm
Parallelization of the pressurization surface: Manual
Process control: Automatic (Lad control) and manual

3. Samples of molds